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    Hafnium sputtering target
  • Introduction

    Hafnium (Hf) is a lustrous silver grey, ductile, transition metal. The Hafnium metal is further purified to crystal bars using the van Arkel/de Boer iodine process. Hafnium will resist corrosion in air due to the formation of an oxide film, although powdered hafnium will burn in air.  Hafnium thin film coating can also be used to provide surface hardness and protection. AEM produce Hafnium sputtering targets with highest quality, refined crystal bars, which ensures high purity, low zirconium content, and high reliability.      

    Specification

    Chemical Formula Hf
    Atomic Weight 178.49
    Color/ Appearance Gray Steel, Metallic
    Melting point 2227℃
    Thermal Conductivity 23 W/m.K
    Coefficient of Thermal Expansion 5.9 x 10-6/K
    Theoretical Density (g/cc) 13.31
    Z Ration 0.36
    Sputter DC
    Max powder Density (Watts/Square Inch) 50
    Type of Bond  Indium, Elastomer

    Size

    Description Typical purity Size Shape
    Hafnium Sputtering Targets Hf + Zr>99.99%, Circular: Diameter < 14inch, Thickness > 1mm;    Disc, Plate
     Zr<0.2%, 0.3%&0.5% Block: Length < 32inch, Width < 12inch, Thickness > 1mm Column, Step, Custom-made

    Applicatiom

    1. Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD).
    2. Used for optics including wear protection, decorative coatings, and displays.

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