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    Vanadium Sputtering target
  • Process:
    Thanks to the special forming processes we use, sputtering targets’ actual density almost reach 100%. Our customers benefit from a faster process due to higher sputtering speeds. Our production process for Vanadium sputtering target are:


    Material Vanadium
    Chemical Formula V
    Atomic Weight 50.9415
    Color/ Appearance Silvery Gray, Metallic
    Melting point 1890℃
    Thermal Conductivity 23 W/m.K
    Coefficient of Thermal Expansion 8.4 x 10-6/K
    Theoretical Density (g/cc) 5.96
    Z Ration 0.53
    Sputter DC
    Max powder Density (Watts/Square Inch) 50
    Type of Bond  Indium, Elastomer

    Micrograph

    The flexibility of our production process allows to adjust the microstructure of our coating material to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers.

    Size & Purity

    Purity 99.5%, 99.9%
    Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
    Size Circular: Diameter < 14inch, Thickness > 1mm;  Block: Length < 32inch, Width < 12inch, Thickness > 1mm

    Specification of Vanadium Sputtering Target

    The sputtering targets we produced are high purity, it's most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically certificate of analysis for 3N high purity Vanadium sputtering target.

    Analytical methods:
    1. Metallic elements were analyzed using ICP-OES.
    2. Gas elements were analyzed using LECO.

    Element Actual Units Element Actual Units
    Na   ppm Ni   ppm
    Mg <20 ppm Cu <100 ppm
    Al <20 ppm Zn <50 ppm
    Si   ppm As <20 ppm
    P   ppm Zr <20 ppm
    K <10 ppm Mo <50 ppm
    Ca <10 ppm Cd <20 ppm
    Ti   ppm Sn <20 ppm
    V Matrix ppm Sb <20 ppm
    Cr <50 ppm Ta <50 ppm
    Mn <50 ppm W <50 ppm
    Fe <100 ppm Pb <20 ppm
    Co <100 ppm Bi <20 ppm
    Se   ppm Tl <10 ppm
    O <20 ppm C <20 ppm
    N <20 ppm H   ppm
    S <20        

     

    Application

    1. Use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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