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    Tantalum Sputtering Target
  • Description:

    Purity: Ta>99.95%, 99.99%, 99.995%, 99.999%
    Standard: ASTM B708-05
    Density: >16.1g/cc
    AEM can provide tantalum target with uniform, high density microstructure and controlled texture, which promotes uniform sputtering rates and generally superior sputtering behavior.

    Chemical Composition:

    Grade Chemical composition, max
    Fe Si Mo W Ti Cr Nb Ni O C H N ta≥%
    Ta3 10 20 50 100 10 20 300 10 150 100 30 100 99.95
    Ta2 3 10 10 50 2 10 50 2 120 80 20 80 99.99
    Ta1 1 0.08 10 20 0.8 0.5 20 0.1 100 50 15 50 99.995

    Specification:

    We can supply 8″, 12″ tantalum round shape sputtering target. The largest disc target that we can provide is with 29” diameter. Below are most of the standard sizes for our tantalum rectangle sputtering targets. If you do not see the size that you need, please feel free to contact us.

    Sizes/tolerance(mm.max)

    Thickness Tolerance Width Tolerance Length Tolerance
    GradeⅠ gradeⅡ
    3-8 ±0.1 ±0.2 50-400 ±0.2 50-1500 ±0.2
    8-14 ±0.1 ±0.2 50-350 ±0.2 50-1200 ±0.2
    ≥14 ±0.1 ±0.2 50-300 ±0.2 50-1000 ±0.2
    Recrystallization: >95%
    Surface Roughness: Ra 0.8-1.6
    Flatness: 0.1mm or 0.1%

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