Vanadium Carbide Sputtering Target
Vanadium carbide is the inorganic compound with the formula VC. It is a tough refractory ceramic material. With a hardness of 9-9.5 Mohs, it is possibly the hardest known metal-carbide. It is of interest because it is common in vanadium metal and alloys. Vanadium carbide has an elastic modulus of approximately 380 GPa. Vanadium carbide (VC) thin films were deposited on silicon substrates by direct sputtering of a VC target in an argon atmosphere.
Vanadium Carbide Sputtering Target Properties
Material |
Vanadium Carbide |
Chemical Formula |
VC |
Color/ Appearance |
Dark grey |
Melting Point |
2810℃ |
Theoretical Density (g/cc) |
5.77 |
Z Ration |
1 |
Sputter |
RF |
Type of Bond |
Indium, Elastomer |
Vanadium Carbide Sputtering Target Specifications
Purity: 99.5%
Size: Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Vanadium Carbide Sputtering Target Applications
1. Semiconductor chemical
2. Vapor deposition (CVD) and physical vapor deposition (PVD) display
3. Optical applications
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