Rhenium Sputtering Target
Rhenium sputtering target is a new type of Physical Vapor Deposition(PVD) method. It is widely used in flat panel displays, the glass industry(including architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights, and decorative coating.
For Rhenium sputter target, forged and rolled metal materials are considered better than raw ingots produced by powder metallurgy for their high-density and less gas phase impurities. We are a professional supplier of sputter targets and other deposition materials. Although only in limited quantity and size, we are proud to say rolled rhenium plates are in stock. We can provide high-quality Rhenium sputter targets in a flat form with short lead time and at a competitive price. Please contact us for a price quote of various sizes of Re sputter targets. Since rhenium is a very expensive material, sputter targets could be made as thin as 1mm.
Indium bonding to regular size or custom made backing plate is available, but not suggested for metal,e.g.
Composition: Rhenium
Catalog No.: DPMA75ST
Purity: 99.99%
Maximum diameter: 8"
Typical lead time: 2 weeks
Rhenium Sputtering Target Specifications
Product Name |
Rhenium Sputtering Target |
Purity |
99.9%-99.95% |
Shape |
Discs, plates, column targets, tubing targets, custom-made |
Dimensions |
Customized |
Bonding |
Indium |
Material |
Purity |
Rhenium Sputtering Target 2"D X .125"T |
3N5, 4N |
Rhenium Sputtering Target 2"D X .250"T |
3N5, 4N |
Rhenium Sputtering Target 3"D X .125"T |
3N5, 4N |
Rhenium Sputtering Target 3"D X .250"T |
3N5, 4N |
Rhenium Sputtering Target 4"D X .125"T |
3N5, 4N |
Rhenium Sputtering Target 4"D X .250"T |
3N5, 4N |
Targets are made to order and packaged individually. Call or email for different diameters, thicknesses, or custom sizes.
Rhenium Sputtering Target Applications
Rhenium is primary used as an essential component in superalloys for blades in turbine engines now. Rhenium alloyed with platinum is used in petroleum-reforming catalysis in the production of high-octane hydrocarbons, used for lead-free gasoline.
Typical Analyses of Rhenium Sputtering Target
Material / Purity: |
3N 5 |
4N |
Al |
<35.0 |
<5 |
B |
21 |
<1 |
Ca |
21 |
<1 |
Co |
33 |
<3 |
Cr |
<23.0 |
<3 |
Cu |
<52.0 |
<2 |
Fe |
27 |
<70 |
Mg |
<90.0 |
<1 |
Mn |
<22.0 |
<2 |
Mo |
22.5 |
<25 |
Ni |
<21.0 |
<1 |
Sn |
<32.0 |
<2 |
Tl |
22 |
<2 |
Zr |
<21.0 |
<1 |
K |
<21.0 |
<1 |
Si |
- |
<3 |
Rhenium Sputtering Target Package
Plastic bag, vacuum seal, with COA of the raw material (rhenium plate) for the Re sputter target.
Related Products of Rhenium Sputtering Target