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    Niobium Sputtering Target
  • Material Type Niobium Z Ratio 0.492
    Symbol Nb Sputter DC
    Atomic Weight 92.90638 Max Power Density* 100
    Atomic Number 41 (Watts/Square Inch)
    Color/Appearance Gray, Metallic Type of Bond Indium, Elastomer
    Thermal Conductivity 54 W/m.K Comments Attacks W source.
    Melting Point (°C) 2,468    
    Coefficient of Thermal Expansion 7.3 x 10-6/K    

    Description:

    Purity: Nb>99.9%, 99.95%, 99.99%, 99.995%
    Standard: ASTM B393-05
    Density: >8.3g/cc
    Recrystallization: >95%
    Surface Roughness: Ra 0.8-1.6
    Flatness: 0.1mm or 0.1%AEM can provide niobium target with uniform, high density microstructure and controlled texture, which promotes uniform sputtering rates and generally superior sputtering behavior.

    Chemical composition

    Grade Chemical composition, max
    Fe Si Mo W Ti Cr Ta Ni O C H N Nb+Ta≥%
    Nb3 20 20 80 100 10 10 1000 20 250 100 15 150 99.9
    Nb2 10 10 50 50 5 5 500 10 200 50 10 100 99.95
    Nb1 5 5 10 20 1 1 100 1 100 30 10 50 99.99

    Specification:

    We can supply 8″, 12″ niobium round shape sputtering target. The largest disc target that we can provide is with 29” diameter. Below are most of the standard sizes for our tantalum rectangle sputtering targets. If you do not see the size that you need, please feel free to contact us.

    Sizes/tolerance(mm.max)

    Thickness Tolerance Width Tolerance Length Tolerance
    GradeⅠ gradeⅡ
    3-8 ±0.1 ±0.2 50-400 ±0.2 50-1800 ±0.2
    8-14 ±0.1 ±0.2 50-350 ±0.2 50-1500 ±0.2
    ≥14 ±0.1 ±0.2 50-300 ±0.2 50-1200 ±0.2

    Sizes/tolerance(mm.max)

    Thickness Tolerance Diameter Diameter tolerance
    GradeⅠ gradeⅡ
    3-8 ±0.1 ±0.2 50-450 ±0.2
    8-14 ±0.1 ±0.2 50-450 ±0.2
    ≥14 ±0.1 ±0.2 50-400 ±0.2

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